Abstract
The roles of laser-induced defects and native defects in multilayer mirrors
under multi-shot irradiation condition are investigated. The HfO2/SiO2 dielectric
mirrors are deposited by electron beam evaporation (EBE). Laser damage testing is
carried out on both the 1-on-1 and S-on-1 regimes using 355-nm pulsed laser at a
duration of 8 ns. It is found that the single-shot laser-induced damage threshold
(LIDT) is much higher than the multi-shot LIDT. In the multi-shot mode, the main
factor influencing LIDT is the accumulation of irreversible laser-induced defects
and native defects. The surface morphologies of the samples are observed by optical
microscopy. Moreover, the number of laser-induced defects affects the damage
probability of the samples. A correlative model based on critical conduction band
(CB) electron density (ED) is presented to simulate the multi-shot damage behavior.
© 2011 Chinese Optics Letters
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